SÍNTESE E CARACTERIZAÇÃO DE FILMES FINOS DE ZrN DEPOSITADOS EM DIFERENTES TEMPERATURAS
SYNTESIS AND CHARACTERIZATION OF ZrN THIN FILMS DEPOSITED AT DIFFERENT TEMPERATURES
Roman, Daiane; Bernardi, Juliane; Amorim, Cintia Lugnani G. de; Figueroa, Carlos Alejandro; Baumvol, Israel Jacob R.; Basso, Rodrigo Leonardo de O.
http://dx.doi.org/10.4322/tmm.2011.027
Tecnol. Metal. Mater. Min., vol.8, n3, p.174-178, 2011
Resumo
Filmes finos nanométricos de nitreto de zircônio (ZrN) foram depositados sobre diferentes substratos, objetivando-se estudar a microestrutura cristalina da superfície e investigar o comportamento eletroquímico para obter a melhor composição que minimize reações de corrosão. Os revestimentos foram produzidos por deposição física de vapor (PVD). É estudada a influência da pressão parcial do gás nitrogênio, do tempo e da temperatura de deposição, nas propriedades da superfície. Os filmes de ZrN foram caracterizados pelas técnicas de espectrometria por espalhamento Rutherford (RBS), espectroscopia por fotoelétrons de raios X (XPS), difração de raios X (XRD) e ensaios de corrosão. Como esperado, as propriedades dos filmes finos de ZrN e as microestruturas variam com os parâmetros de deposição. Quanto maior a temperatura usada na deposição dos filmes maior a resistência contra a corrosão. Quando depositado sobre o titânio, os ensaios de corrosão mostram que os revestimentos de ZrN depositados por PVD pode efetivamente melhorar a resistência contra a corrosão.
Palavras-chave
Nitreto de zircônio, Revestimento PVD, Corrosão
Abstract
Zirconium nitride (ZrN) nanometric films were deposited onto different substrates, in order to study the surface crystalline microstructure and also to investigate the electrochemical behavior to obtain a better composition that minimizes corrosion reactions. The coatings were produced by physical vapor deposition (PVD). The influence of the nitrogen partial pressure, deposition time and temperature over the surface properties is studied. Rutherford backscattering spectrometry (RBS), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), scanning electron microscopy (SEM) techniques and corrosion experiments were performed to characterize the ZrN hard coatings. As expected, the ZrN films properties and microstructure changes according to the deposition parameters. The corrosion resistance increases with the temperature used in the films deposition. Corrosion tests show that ZrN coatings deposited by PVD onto titanium substrate can improve the corrosion resistance.
Keywords
Zirconium nitride, PVD hard coating, Corrosion
Referências
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13 MILOSEV, I. et al. Electrochemical oxidation of ZrN hard (PVD) coatings studied by XPS. Surface and Interface Analisys, v. 24, n. 7, p. 448-58, July 1996.
2 DELACHAUX, T. et al. Nitriding of tetragonal zirconia in a high current d.c. plasma source. Thin Solid Films, v. 425, n. 1-2, p. 113-6, Feb. 2003.
3 HEINRICH, S. et al. Comparison of ZrN and TiN formed by plasma based ion implantation e deposition. Surface and Coatings Technology, v. 202, n. 11, p. 2310-3, Feb. 2008.
4 CONFORTO, E. et al. Rough surfaces of titanium and titanium alloys for implants and prostheses. Materials Science and Engineering C, v. 24, n. 5, p. 611-8, Nov. 2004.
5 ZHENG, Y. F. et al. Enhanced corrosion resistance of Zr coating on biomedical TiNi alloy prepared by plasma immersion ion implantation and deposition. Applied Surface Science, v. 255, n. 2, p. 512-4, Nov. 2008.
6 CHU, P. K., Enhancement of surfaces properties of biomaterials using plasma-based technologies. Surface and Coatings Technology, v. 201, n. 19-20, p. 8076-82, Aug. 2007.
7 WASA, K.; KITANABE, M.; ADACHI, H. Thin film materials technology: sputtering of compound materials. Norwich: William Andrew. 2004.
8 MANAILA, R. et al. Structure of nitride film hard coatings prepared by reactive magnetron sputtering. Applied Surface Science, v. 134, n. 1-4, p. 1-10, Sep. 1998.
9 YU-CHIH CHIEH; WEN-ZHENG LO; FU-HSING LU. Microstructure evolution of ZrN films annealed in vacuum. Surface and Coatings Technology, v. 200, n. 10, p. 3336-40, Feb. 2006.
10 SIGNORE, M.A. et al. Characterization of zirconium oxynitride films obtained by radio frequency magnetron reactive sputtering. Thin Solid Films, v. 515, n. 17, p. 6798-6804, June 2007.
11 PIETRO, P.; GALAN, L.; SANZ, J. Electronic structure of insulating zirconium nitride. Physical Review B, v. 47, n. 3, p. 1613-5, Jan. 1993.
12 CARVALHO, P. et al. Influence of the chemical and electronic structure on the electrical behavior of zirconium oxynitride films. Journal of Applied Physics, v. 103, n. 10,p. 1-15, May 2008.
13 MILOSEV, I. et al. Electrochemical oxidation of ZrN hard (PVD) coatings studied by XPS. Surface and Interface Analisys, v. 24, n. 7, p. 448-58, July 1996.
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